Senior Resist Modeling Engineer

• PhD or equivalent professional experience in Applied Physics, Chemical Engineering, Materials Science, or a related field with a strong focus on computational simulations.

• Strong knowledge in the fundamentals of photolithography, resist chemistry, and semiconductor processing.

• Proven expertise in process-level or Monte Carlo simulations.

• 2+ years of industry or applied research experience in lithography or semiconductor process R&D.

• Prior experience in computational modeling of photoresist materials.

• Strong coding skills in Python/Julia frameworks.

• Experience collaborating closely with experimental/lab teams to derive semi-emperical models.

Competitive salary + equity through our incentive plan.

€600 annual wellness allowance, weekly team lunches, monthly social events, and an annual off-site with the whole team.

We support relocation and immigration to make joining Lace as smooth and welcoming as possible.

At Lace Lithography, w e're scaling our team and looking for a sharp, passionate teammate to join us to build something really, really small. You'll simulate the chemistry that brings our patterns to life.

In our company we build chip lithography technology that will enable the next 100 years of chip manufacturing. Founded in 2023, we're based in Bergen (Norway), Eindhoven (The Netherlands) and Barcelona (Spain), and backed by some of the world's most ambitious investors. Who Are We Looking For

You will act as the vital bridge between our Resist Chemistry and Mask Optimization teams, ensuring our computational models match real-world process constraints. You thrive in a collaborative fast paced environment working on complex, interconnected, and evolving problems with a strong drive to learn new concepts.

• Model the aerial image-to-pattern transfer through the resist, accounting for stochastic effects predicting critical parameters like LER and LWR.

• Build a full resist simulation framework for a variety of resist materials, integrating resist activation physics into our resist-mask optimization framework.

• Develop and apply process-level or Monte Carlo simulation methods to predict resist performance and guide process window optimization.

• Work with our Bergen team and external collaborators to optimize resist behaviour and performance.

We encourage cross-site collaboration and support travel between our York, Barcelona, and Bergen locations to stay connected and aligned.